Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO2 thin films
Titanium dioxide (TiO2) films with thicknesses around 300 nm were deposited on glass substrates by reactive radio frequency (RF) magnetron sputtering at constant RF sputtering power (200 W), high sputtering pressure and room temperature. The effects of the oxygen presence on the growth and properti...
| Autores principales: | , , , , , |
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| Formato: | Artículo |
| Lenguaje: | English |
| Publicado: |
2017
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| Materias: | |
| Acceso en línea: | http://eprints.uanl.mx/18278/1/567.pdf |