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Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO2 thin films

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Titanium dioxide (TiO2) films with thicknesses around 300 nm were deposited on glass substrates by reactive radio frequency (RF) magnetron sputtering at constant RF sputtering power (200 W), high sputtering pressure and room temperature. The effects of the oxygen presence on the growth and properti...

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Detalles Bibliográficos
Autores principales: Korpi, A.R. Grayeli, Rezaee, Sahare, Luna Criado, Carlos, Talu, S., Arman, A., Ahmadpourian, Azin
Formato: Artículo
Lenguaje:inglés
Publicado: 2017
Materias:
QC Física
Acceso en línea:http://eprints.uanl.mx/18278/1/567.pdf

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