AC plasma induced modifications in Sb2S3thin films

Sb2S3 thin films, deposited by the chemical bath deposition method, were treated with N2 plasma at 3.0 Torr during several minutes. The as-prepared Sb2S3 thin films and films treated with N2 plasma have been characterized using several techniques. X-ray diffraction studies have shown that plasma tre...

Full description

Bibliographic Details
Main Authors: Calixto Rodriguez, María Estela, Castillo, F., Martínez, Heriberto, Peña Méndez, Yolanda, Sánchez Juárez, Arón
Format: Article
Language:English
Published: 2010
Online Access:http://eprints.uanl.mx/15084/1/755.pdf
_version_ 1824414252574703616
author Calixto Rodriguez, María Estela
Castillo, F.
Martínez, Heriberto
Peña Méndez, Yolanda
Sánchez Juárez, Arón
author_facet Calixto Rodriguez, María Estela
Castillo, F.
Martínez, Heriberto
Peña Méndez, Yolanda
Sánchez Juárez, Arón
author_sort Calixto Rodriguez, María Estela
collection Repositorio Institucional
description Sb2S3 thin films, deposited by the chemical bath deposition method, were treated with N2 plasma at 3.0 Torr during several minutes. The as-prepared Sb2S3 thin films and films treated with N2 plasma have been characterized using several techniques. X-ray diffraction studies have shown that plasma treatment induced recrystallization on the as-prepared Sb2S3 thin films. The band gap values decreased from 2.37 to 1.82 eV after plasma treatment, and the electrical conductivity increased from 10 to 10 ( cm) due to the annealing effect.
format Article
id eprints-15084
institution UANL
language English
publishDate 2010
record_format eprints
spelling eprints-150842020-06-09T21:11:18Z http://eprints.uanl.mx/15084/ AC plasma induced modifications in Sb2S3thin films Calixto Rodriguez, María Estela Castillo, F. Martínez, Heriberto Peña Méndez, Yolanda Sánchez Juárez, Arón Sb2S3 thin films, deposited by the chemical bath deposition method, were treated with N2 plasma at 3.0 Torr during several minutes. The as-prepared Sb2S3 thin films and films treated with N2 plasma have been characterized using several techniques. X-ray diffraction studies have shown that plasma treatment induced recrystallization on the as-prepared Sb2S3 thin films. The band gap values decreased from 2.37 to 1.82 eV after plasma treatment, and the electrical conductivity increased from 10 to 10 ( cm) due to the annealing effect. 2010 Article PeerReviewed text en cc_by_nc_nd http://eprints.uanl.mx/15084/1/755.pdf http://eprints.uanl.mx/15084/1.haspreviewThumbnailVersion/755.pdf Calixto Rodriguez, María Estela y Castillo, F. y Martínez, Heriberto y Peña Méndez, Yolanda y Sánchez Juárez, Arón (2010) AC plasma induced modifications in Sb2S3thin films. Journal of Physics: Conference Series, 207. 012019. ISSN 1742-6596 http://doi.org/10.1088/1742-6596/207/1/012019 doi:10.1088/1742-6596/207/1/012019
spellingShingle Calixto Rodriguez, María Estela
Castillo, F.
Martínez, Heriberto
Peña Méndez, Yolanda
Sánchez Juárez, Arón
AC plasma induced modifications in Sb2S3thin films
thumbnail https://rediab.uanl.mx/themes/sandal5/images/online.png
title AC plasma induced modifications in Sb2S3thin films
title_full AC plasma induced modifications in Sb2S3thin films
title_fullStr AC plasma induced modifications in Sb2S3thin films
title_full_unstemmed AC plasma induced modifications in Sb2S3thin films
title_short AC plasma induced modifications in Sb2S3thin films
title_sort ac plasma induced modifications in sb2s3thin films
url http://eprints.uanl.mx/15084/1/755.pdf
work_keys_str_mv AT calixtorodriguezmariaestela acplasmainducedmodificationsinsb2s3thinfilms
AT castillof acplasmainducedmodificationsinsb2s3thinfilms
AT martinezheriberto acplasmainducedmodificationsinsb2s3thinfilms
AT penamendezyolanda acplasmainducedmodificationsinsb2s3thinfilms
AT sanchezjuarezaron acplasmainducedmodificationsinsb2s3thinfilms