Characterization of CusBiS3 thin films annealing layers of BizS3-CuS chemically deposited

Cu3BiS3 thin films with values of thickness 170 nm were obtained; these films were characterized using X-ray diffraction, Electron Microscopy Scanning, UV-Vis spectrophotometry, and photoconductivity. We obtained values of bang gap energy 1.65 eV and electrical conductivity approximately 2.58 (&...

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Detalles Bibliográficos
Autores principales: Gonzalez, Erick, Peña, Yolanda, Gomez, Idalia, Ildusovich, Boris, Hernandez, Tomas, Cavazos, José Luis
Formato: Artículo
Lenguaje:spa
Publicado: Universidad Autónoma de Nuevo León 2022
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Acceso en línea:https://quimicahoy.uanl.mx/index.php/r/article/view/312