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Nanohardness and Residual Stress in TiN Coatings

TiN films were prepared by the Cathodic arc evaporation deposition method under different negative substrate bias. AFM image analyses show that the growth mode of biased coatings changes from 3D island to lateral when the negative bias potential is increased. Nanohardness of the thin films was measu...

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Detalles Bibliográficos
Autores principales:	Hernández, Luis Carlos, Ponce, Luis, Fundora, Abel, López, Enrique, Pérez, Eduardo
Formato:	Artículo
Lenguaje:	inglés
Publicado:	2011
Acceso en línea:	http://eprints.uanl.mx/15078/1/729.pdf

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