Nanohardness and Residual Stress in TiN Coatings
TiN films were prepared by the Cathodic arc evaporation deposition method under different negative substrate bias. AFM image analyses show that the growth mode of biased coatings changes from 3D island to lateral when the negative bias potential is increased. Nanohardness of the thin films was measu...
Autores principales: | , , , , |
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Formato: | Artículo |
Lenguaje: | inglés |
Publicado: |
2011
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Acceso en línea: | http://eprints.uanl.mx/15078/1/729.pdf |
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author | Hernández, Luis Carlos Ponce, Luis Fundora, Abel López, Enrique Pérez, Eduardo |
author_facet | Hernández, Luis Carlos Ponce, Luis Fundora, Abel López, Enrique Pérez, Eduardo |
author_sort | Hernández, Luis Carlos |
collection | Repositorio Institucional |
description | TiN films were prepared by the Cathodic arc evaporation deposition method under different negative substrate bias. AFM image analyses show that the growth mode of biased coatings changes from 3D island to lateral when the negative bias potential is increased. Nanohardness of the thin films was measured by nanoindentation, and residual stress was determined using Grazing incidence X ray diffraction. The maximum value of residual stress is reached at −100 V substrate bias coinciding with the biggest values of adhesion and nanohardness. Nanoindentation measurement proves that the force-depth curve shifts due to residual stress. The experimental results demonstrate that nanohardness is seriously affected by the residual stress. |
format | Article |
id | eprints-15078 |
institution | UANL |
language | English |
publishDate | 2011 |
record_format | eprints |
spelling | eprints-150782019-04-29T18:44:28Z http://eprints.uanl.mx/15078/ Nanohardness and Residual Stress in TiN Coatings Hernández, Luis Carlos Ponce, Luis Fundora, Abel López, Enrique Pérez, Eduardo TiN films were prepared by the Cathodic arc evaporation deposition method under different negative substrate bias. AFM image analyses show that the growth mode of biased coatings changes from 3D island to lateral when the negative bias potential is increased. Nanohardness of the thin films was measured by nanoindentation, and residual stress was determined using Grazing incidence X ray diffraction. The maximum value of residual stress is reached at −100 V substrate bias coinciding with the biggest values of adhesion and nanohardness. Nanoindentation measurement proves that the force-depth curve shifts due to residual stress. The experimental results demonstrate that nanohardness is seriously affected by the residual stress. 2011 Article PeerReviewed text en cc_by_nc_nd http://eprints.uanl.mx/15078/1/729.pdf http://eprints.uanl.mx/15078/1.haspreviewThumbnailVersion/729.pdf Hernández, Luis Carlos y Ponce, Luis y Fundora, Abel y López, Enrique y Pérez, Eduardo (2011) Nanohardness and Residual Stress in TiN Coatings. Materials, 4 (5). pp. 929-940. ISSN 1996-1944 http://doi.org/10.3390/ma4050929 doi:10.3390/ma4050929 |
spellingShingle | Hernández, Luis Carlos Ponce, Luis Fundora, Abel López, Enrique Pérez, Eduardo Nanohardness and Residual Stress in TiN Coatings |
thumbnail | https://rediab.uanl.mx/themes/sandal5/images/online.png |
title | Nanohardness and Residual Stress in TiN Coatings |
title_full | Nanohardness and Residual Stress in TiN Coatings |
title_fullStr | Nanohardness and Residual Stress in TiN Coatings |
title_full_unstemmed | Nanohardness and Residual Stress in TiN Coatings |
title_short | Nanohardness and Residual Stress in TiN Coatings |
title_sort | nanohardness and residual stress in tin coatings |
url | http://eprints.uanl.mx/15078/1/729.pdf |
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