Nanohardness and Residual Stress in TiN Coatings

TiN films were prepared by the Cathodic arc evaporation deposition method under different negative substrate bias. AFM image analyses show that the growth mode of biased coatings changes from 3D island to lateral when the negative bias potential is increased. Nanohardness of the thin films was measu...

Descripción completa

Detalles Bibliográficos
Autores principales: Hernández, Luis Carlos, Ponce, Luis, Fundora, Abel, López, Enrique, Pérez, Eduardo
Formato: Artículo
Lenguaje:inglés
Publicado: 2011
Acceso en línea:http://eprints.uanl.mx/15078/1/729.pdf
_version_ 1824414250046586880
author Hernández, Luis Carlos
Ponce, Luis
Fundora, Abel
López, Enrique
Pérez, Eduardo
author_facet Hernández, Luis Carlos
Ponce, Luis
Fundora, Abel
López, Enrique
Pérez, Eduardo
author_sort Hernández, Luis Carlos
collection Repositorio Institucional
description TiN films were prepared by the Cathodic arc evaporation deposition method under different negative substrate bias. AFM image analyses show that the growth mode of biased coatings changes from 3D island to lateral when the negative bias potential is increased. Nanohardness of the thin films was measured by nanoindentation, and residual stress was determined using Grazing incidence X ray diffraction. The maximum value of residual stress is reached at −100 V substrate bias coinciding with the biggest values of adhesion and nanohardness. Nanoindentation measurement proves that the force-depth curve shifts due to residual stress. The experimental results demonstrate that nanohardness is seriously affected by the residual stress.
format Article
id eprints-15078
institution UANL
language English
publishDate 2011
record_format eprints
spelling eprints-150782019-04-29T18:44:28Z http://eprints.uanl.mx/15078/ Nanohardness and Residual Stress in TiN Coatings Hernández, Luis Carlos Ponce, Luis Fundora, Abel López, Enrique Pérez, Eduardo TiN films were prepared by the Cathodic arc evaporation deposition method under different negative substrate bias. AFM image analyses show that the growth mode of biased coatings changes from 3D island to lateral when the negative bias potential is increased. Nanohardness of the thin films was measured by nanoindentation, and residual stress was determined using Grazing incidence X ray diffraction. The maximum value of residual stress is reached at −100 V substrate bias coinciding with the biggest values of adhesion and nanohardness. Nanoindentation measurement proves that the force-depth curve shifts due to residual stress. The experimental results demonstrate that nanohardness is seriously affected by the residual stress. 2011 Article PeerReviewed text en cc_by_nc_nd http://eprints.uanl.mx/15078/1/729.pdf http://eprints.uanl.mx/15078/1.haspreviewThumbnailVersion/729.pdf Hernández, Luis Carlos y Ponce, Luis y Fundora, Abel y López, Enrique y Pérez, Eduardo (2011) Nanohardness and Residual Stress in TiN Coatings. Materials, 4 (5). pp. 929-940. ISSN 1996-1944 http://doi.org/10.3390/ma4050929 doi:10.3390/ma4050929
spellingShingle Hernández, Luis Carlos
Ponce, Luis
Fundora, Abel
López, Enrique
Pérez, Eduardo
Nanohardness and Residual Stress in TiN Coatings
thumbnail https://rediab.uanl.mx/themes/sandal5/images/online.png
title Nanohardness and Residual Stress in TiN Coatings
title_full Nanohardness and Residual Stress in TiN Coatings
title_fullStr Nanohardness and Residual Stress in TiN Coatings
title_full_unstemmed Nanohardness and Residual Stress in TiN Coatings
title_short Nanohardness and Residual Stress in TiN Coatings
title_sort nanohardness and residual stress in tin coatings
url http://eprints.uanl.mx/15078/1/729.pdf
work_keys_str_mv AT hernandezluiscarlos nanohardnessandresidualstressintincoatings
AT ponceluis nanohardnessandresidualstressintincoatings
AT fundoraabel nanohardnessandresidualstressintincoatings
AT lopezenrique nanohardnessandresidualstressintincoatings
AT perezeduardo nanohardnessandresidualstressintincoatings