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Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO 2 thin films

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Titanium dioxide (TiO2) films with thicknesses around 300 nm were deposited on glass substrates by reactive radio frequency (RF) magnetron sputtering at constant RF sputtering power (200 W), high sputtering pressure and room temperature. The effects of the oxygen presence on the growth and propertie...

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Bibliographic Details
Main Authors:	Korpi, A.R. Grayeli, Rezaee, Sahare, Luna Criado, Carlos, Talu, S., Arman, A., Ahmadpourian, Azin
Format:	Article
Language:	English
Published:	2017
Online Access:	http://eprints.uanl.mx/14616/1/121.pdf

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