Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO 2 thin films
Titanium dioxide (TiO2) films with thicknesses around 300 nm were deposited on glass substrates by reactive radio frequency (RF) magnetron sputtering at constant RF sputtering power (200 W), high sputtering pressure and room temperature. The effects of the oxygen presence on the growth and propertie...
| Main Authors: | , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
2017
|
| Online Access: | http://eprints.uanl.mx/14616/1/121.pdf |
| _version_ | 1824414099622068224 |
|---|---|
| author | Korpi, A.R. Grayeli Rezaee, Sahare Luna Criado, Carlos Talu, S. Arman, A. Ahmadpourian, Azin |
| author_facet | Korpi, A.R. Grayeli Rezaee, Sahare Luna Criado, Carlos Talu, S. Arman, A. Ahmadpourian, Azin |
| author_sort | Korpi, A.R. Grayeli |
| collection | Repositorio Institucional |
| description | Titanium dioxide (TiO2) films with thicknesses around 300 nm were deposited on glass substrates by reactive radio frequency (RF) magnetron sputtering at constant RF sputtering power (200 W), high sputtering pressure and room temperature. The effects of the oxygen presence on the growth and properties of the films were investigated using mixtures of Ar and O2 with different O2/(Ar + O2) ratios (from 0.0 to 0.3) during the sample deposition. The crystalline properties and surface morphology were characterized using X-ray diffraction (XRD) and atomic force microscopy (AFM), respectively. The optical properties were studied by ultraviolet–visible–near infrared (UV–Vis–NIR) spectroscopy, and the refractive index and the thickness of the samples were obtained using the Swanepoel method. The obtained results indicate that all the TiO2 films grew with an anatase phase and with an improved crystallinity at O2/(Ar + O2) = 0.2. However, AFM studies show that the grain size and surface roughness decrease as the O2/(Ar + O2) ratio increases from 0.0 to 0.3. Moreover, a maximum refractive index was obtained for the sample prepared at O2/(Ar + O2) = 0.2. 2017 Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/). |
| format | Article |
| id | eprints-14616 |
| institution | UANL |
| language | English |
| publishDate | 2017 |
| record_format | eprints |
| spelling | eprints-146162024-12-11T17:31:56Z http://eprints.uanl.mx/14616/ Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO 2 thin films Korpi, A.R. Grayeli Rezaee, Sahare Luna Criado, Carlos Talu, S. Arman, A. Ahmadpourian, Azin Titanium dioxide (TiO2) films with thicknesses around 300 nm were deposited on glass substrates by reactive radio frequency (RF) magnetron sputtering at constant RF sputtering power (200 W), high sputtering pressure and room temperature. The effects of the oxygen presence on the growth and properties of the films were investigated using mixtures of Ar and O2 with different O2/(Ar + O2) ratios (from 0.0 to 0.3) during the sample deposition. The crystalline properties and surface morphology were characterized using X-ray diffraction (XRD) and atomic force microscopy (AFM), respectively. The optical properties were studied by ultraviolet–visible–near infrared (UV–Vis–NIR) spectroscopy, and the refractive index and the thickness of the samples were obtained using the Swanepoel method. The obtained results indicate that all the TiO2 films grew with an anatase phase and with an improved crystallinity at O2/(Ar + O2) = 0.2. However, AFM studies show that the grain size and surface roughness decrease as the O2/(Ar + O2) ratio increases from 0.0 to 0.3. Moreover, a maximum refractive index was obtained for the sample prepared at O2/(Ar + O2) = 0.2. 2017 Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/). 2017 Article PeerReviewed text en cc_by_nc_nd http://eprints.uanl.mx/14616/1/121.pdf http://eprints.uanl.mx/14616/1.haspreviewThumbnailVersion/121.pdf Korpi, A.R. Grayeli y Rezaee, Sahare y Luna Criado, Carlos y Talu, S. y Arman, A. y Ahmadpourian, Azin (2017) Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO 2 thin films. Results in Physics, 7. pp. 3349-3352. ISSN 22113797 http://doi.org/10.1016/j.rinp.2017.08.018 doi:10.1016/j.rinp.2017.08.018 |
| spellingShingle | Korpi, A.R. Grayeli Rezaee, Sahare Luna Criado, Carlos Talu, S. Arman, A. Ahmadpourian, Azin Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO 2 thin films |
| thumbnail | https://rediab.uanl.mx/themes/sandal5/images/online.png |
| title | Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO 2 thin films |
| title_full | Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO 2 thin films |
| title_fullStr | Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO 2 thin films |
| title_full_unstemmed | Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO 2 thin films |
| title_short | Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO 2 thin films |
| title_sort | influence of the oxygen partial pressure on the growth and optical properties of rf sputtered anatase tio 2 thin films |
| url | http://eprints.uanl.mx/14616/1/121.pdf |
| work_keys_str_mv | AT korpiargrayeli influenceoftheoxygenpartialpressureonthegrowthandopticalpropertiesofrfsputteredanatasetio2thinfilms AT rezaeesahare influenceoftheoxygenpartialpressureonthegrowthandopticalpropertiesofrfsputteredanatasetio2thinfilms AT lunacriadocarlos influenceoftheoxygenpartialpressureonthegrowthandopticalpropertiesofrfsputteredanatasetio2thinfilms AT talus influenceoftheoxygenpartialpressureonthegrowthandopticalpropertiesofrfsputteredanatasetio2thinfilms AT armana influenceoftheoxygenpartialpressureonthegrowthandopticalpropertiesofrfsputteredanatasetio2thinfilms AT ahmadpourianazin influenceoftheoxygenpartialpressureonthegrowthandopticalpropertiesofrfsputteredanatasetio2thinfilms |